| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photoresist composition superior in various performances. SOLUTION: The positive photoresist composition contains a quinonediazido compound and 2 kinds of novolak resins obtained by condensing phenolic compounds having these compounds shown by formulae I and II with aldeghydes, and in the formulae I and II, each of R<1> and R<2> is, independently, H atom or an alkyl or cycloalkyl or alkenyl group; (n) is 1, 2, or 3; R<3> is H atom or a 1-3C alkyl group, and when (n) is not 1, each of plural R<3> may be different from each other; and each of R<4> -R<6> is, independently, H atom or an alkyl, alkenyl, cycloalkyl, aryl, hydroxy, or alkoxy group. |
