发明名称 POSITION DETECTING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To enable the position of a mark to be detected independent of the surface condition of a substrate by a method wherein the position of the mark is separately obtained corresponding to each spatial frequency component basing on photoelectric signals, and the obtained position of the mark is multiplied by a weight attendant on an amplitude change corresponding to an intensity change in a diffracted light ray of each degree and averaged. SOLUTION: A first position dataΔX1 which specifies the position of a lattice pattern MG is calculated by a detection circuit 56 basing on a relation between a level change in a first photoelectric signal and a position (or temporal reference) which serves as a relative scan reference. A second position dataΔX2 which specifies the position of the lattice pattern MG is calculated basing on a relation between a level change in a second photoelectric signal and a position (or temporal reference) which serves as a relative scan reference. The first position dataΔX1 and the second position dataΔX2 are weightedly averaged by a weighted average calculating means 60 using a first weight coefficient C1 and a second weight coefficient C2 X, and the most probable positionΔX of the lattice pattern MG is determined.
申请公布号 JPH0992596(A) 申请公布日期 1997.04.04
申请号 JP19950245800 申请日期 1995.09.25
申请人 NIKON CORP 发明人 SHIRAISHI NAOMASA
分类号 G01B11/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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