发明名称 SELECTIVE DEPOSITION MODELING METHOD AND APPARATUS FOR FORMING THREE-DIMENSIONAL OBJECTS AND SUPPORTS
摘要 Methods of manipulating data in a thermal stereolithography apparatus, characterized in that the data represents a plurality of start/stop transitions to facilitate the computation of Boolean operations.
申请公布号 WO9711837(A1) 申请公布日期 1997.04.03
申请号 WO1996US15639 申请日期 1996.09.27
申请人 3D SYSTEMS, INC. 发明人 LEYDEN, RICHARD, N.;THAYER, JEFFREY, S.;BEDAL, BRYAN, J., L.;ALMQUIST, THOMAS, A.;HULL, CHARLES, W.;EARL, JOCELYN, M.;KEREKES, THOMAS, A.;SMALLEY, DENNIS, R.;MEROT, CHRISTIAN, M.;FEDCHENKO, RICHARD, P.;LOCKARD, MICHAEL, S.;PANG, THOMAS, H.;THAT, DINH, TON
分类号 B22F3/00;B29C35/08;B29C41/12;B29C41/36;B29C67/00;B29K63/00;G06T17/00 主分类号 B22F3/00
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