PROCESS FOR CLEANING AND DRYING SEMICONDUCTORS AND EQUIPMENT THERFOR

摘要

A process for cleaning and drying a semiconductor is provided together with safely handleable equipment therefor permitting excellent cleaning and drying in a shorter time, which process comprises the step of putting a semiconductor substrate (1) in a treating bath and feeding wash water into the bath (11) up to such a level as to immerse the semiconductor substrate therein completely, the step of feeding an inert gas into the upper zone above the surface of the wash water so as to make the atmosphere of the zone inert, the step of instantaneously feeding a water-soluble organic solvent into the bath at a desired rate along the surface of the wash water so as to form instantaneously a coexistent state of the wash water phase W, the organic solvent phase O, and the inert gas phase G, the step of pulling up the semiconductor substrate from the wash water phase toward the inert gas phase the instant that the coexistent state of the three phases is formed, and the step of drying the semiconductor substrate in the inert gas phase.