发明名称 |
METHOD AND APPARATUS FOR SILICON DEPOSITION IN A FLUIDIZED-BED REACTOR |
摘要 |
Silicon beads (102) are produced by chemical vapor deposition (CVD) on seed particles (102) generated internal to a CVD reactor (101). The reactor (101) has multiple zones, including an inlet zone (116) where beads (102) are maintained in a submerged spouted bed and an upper zone (118, 120) where beads are maintained in a bubbling fluidized bed. A tapered portion (118) of the upper zone (118, 120) segregates beads by size. Systems for inspecting, sorting and transporting product beads are also disclosed. |
申请公布号 |
WO9641036(A3) |
申请公布日期 |
1997.04.03 |
申请号 |
WO1996US09690 |
申请日期 |
1996.06.07 |
申请人 |
ADVANCED SILICON MATERIALS, INC. |
发明人 |
LORD, STEPHEN, M.;MILLIGAN, ROBERT, J. |
分类号 |
B01J8/24;C01B33/027;C23C16/24;C23C16/44;C23C16/442 |
主分类号 |
B01J8/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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