| 摘要 |
PURPOSE:To prevent cracking in an electric charge transfer layer by laminating the charge transfer layer made of aluminum oxide and a charge generating layer composed essentially of an amorphous silicon on a conductive substrate made of stainless steel. CONSTITUTION:The charge transfer layer made of aluminum oxide and having a film thickness of, preferably, >=1mum for the purpose of obtaining a favorable effect, and the charge generating layer composed essentially of amorphous silicon, and when needed a surface protective layer are laminated thereon, are successively provided on the conductive substrate which needs to be made of the stainless steel, and any kind of stainless steel may be used; for example, austenite type, ferrite type, or martensite type may be used. |
