发明名称 |
Positive working photoresist composition |
摘要 |
Provided is a positive working photoresist composition comprising (A) an alkali-soluble novolak resin obtained by condensation reaction of a mixture of phenols, which are constituted of specified proportions of m-cresol and two kinds of specific phenols, with an aldehyde and having a Mw/Mn ratio of from 1.5 to 4.0 (wherein Mw stands for a weight-average molecular weight, and Mn stands for a number-average molecular weight); (B) a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid ester as a photosensitive material; and (C) a low molecular weight compound having from 12 to 50 carbon atoms per molecule and from 2 to 8 phenolic hydroxy groups per molecule. |
申请公布号 |
EP0766139(A1) |
申请公布日期 |
1997.04.02 |
申请号 |
EP19960115173 |
申请日期 |
1996.09.20 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KAWABE, YASUMASA;TAN, SHIRO |
分类号 |
G03F7/023;G03F7/039;H01L21/027 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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