Method of manufacturing a thin film transistor

摘要

The manufacturing processes can be simplified and the reliability can be improved. A method of processing a thin film includes a first process of selectively forming a resist pattern (35) on a ground surface, a second process of forming a thin film (41) on the ground surface and a surface of the resist pattern (35), and a third process of removing the resist pattern (35) to selectively remove the thin film deposited on the former, i.e., carrying out the lift-off, thereby the thin film process for a desired pattern being carried out. The lift off is either wet or dry, the resist pattern (35) being removed using a laser.