发明名称 |
Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
摘要 |
In one group of embodiments, two or more small anodes are spaced apart from one another in a magnetron, with some aspect of their electrical power being individually controlled in a manner to control a density profile across a plasma. In another group of embodiments, the same effect is obtained by mechanically moving one or more small anodes or anode masks. When used in a magnetron having either a rotating cylindrical cathode or a stationary planar cathode and designed to sputter films of material onto a substrate, the uniformity of the rate of deposition across the substrate is improved. Also, adverse effects of sputtering dielectric materials are reduced.
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申请公布号 |
US5616225(A) |
申请公布日期 |
1997.04.01 |
申请号 |
US19940216633 |
申请日期 |
1994.03.23 |
申请人 |
THE BOC GROUP, INC. |
发明人 |
SIECK, PETER A.;NEWCOMB, RICHARD;TRUMBLY, TERRY A.;SCHULZ, STEPHEN C. |
分类号 |
H05H1/46;B01J19/08;C23C14/34;C23C14/35;C23C14/54;C23C14/56;C23C16/50;C23F4/00;H01J37/34;H01L21/203;H01L21/205;H01L21/285;(IPC1-7):C23C14/54 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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