DEPOSITED FILM FORMING DEVICE

摘要

PROBLEM TO BE SOLVED: To lessen unequal film thickness even if a high-frequency power source of a high oscillation frequency is used by wiring a cylindrical base body at the shortest distance to a revolving shaft near the center in its generator direction and grounding the base body via the revolving shaft. SOLUTION: The cylindrical base body 102 is set at an auxiliary base body 103. The wiring 106 for grounding connects the cylindrical base body 102 via the auxiliary base body 103 to the revolving shaft 105 to ground the base body. The position where the winding 106 for grounding is mounted is confined to a range of L×0.4 to 0.6 length in the generator direction of the base body 103 from one end of the cylindrical base body 102. The base body 102 is built into a deposition chamber 100 and is rotated by the revolving shaft 105. The high frequency of 20 to 450MHz is impressed from the high-frequency power source 110 on a cathode electrode 101 to form the deposited film on the base body 102. The unequal film thickness in the generator direction of the base body 102 is lessened without increasing the image defects. The plasma treatment is uniformly executed in the relatively large area at high processing speed.