发明名称 GAS LIFT FLOW CONTROL DEVICE.
摘要 <p>A gas flow control device (60) for injecting gas into a downhole production string for recovering pressure and reducing frictional losses, so that critical flow can be reached at lower pressure drops and higher production pressure, includes a housing, inlet ports (54), nose end (61) with check valve (65), and outlet ports (64), and a nozzle (34) having first and second ends, and a flow path therebetween, and a Venturi having first and second ends, and a flow path therebetween. The first end of the Venturi portion is disposed adajcent to the second end of the nozzle. The Venturi flow path is coaxially aligned with the nozzle flow path to provide a continuous flow path therethrough. Such a flow control device that has a gas flow rate performance that is independent of the tubing pressure, even when the tubing pressure is as high as 80 percent to 93 percent of the casing pressure, can be used to increase the production rate, improve the lift efficiency, and eliminate or suppress instability in continuous-flow gas lift wells.</p>
申请公布号 MX9601696(A) 申请公布日期 1997.03.29
申请号 MX19960001696 申请日期 1995.09.04
申请人 HALLIBURTON COMPANY 发明人 ZELIMIR SCHMIDT
分类号 E21B43/12;(IPC1-7):E21B43/12 主分类号 E21B43/12
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