| 摘要 |
The automatic horizontal balance measuring device for a wafer is composed of an automatic horizontal balance measurer(1-20,20), a stage(30) which has X,Y horizontal mobility, and a reduced projection lens(40) which ensures the image forming on the wafer. As a light source it uses the semiconductor laser(1), and as a light direction adjuster, it uses a sector polarizer(11). With the light reducer(12) which can adjust the light amount, it receives the laser beam and converts into a parallel light. It comes on the surface of the wafer at the incidence angle of 76 degree. And by incidence, the parallel beam at the surface of wafer at larger incidence angle, it can obtain the larger area measurement.
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