发明名称 SEMICONDUCTOR PROCESSING APPARATUS AND MANUFACTURE THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To make it possible to prevent the decrease of the connecting strength of a ceramic base material by preventing the rise of the resistance value or disconnection of a wire of a resistance heater even when a ceramic heater is repeatedly used at a high temperature in a semiconductor manufacturing apparatus. SOLUTION: The semiconductor treating apparatus comprises a base material 6 made of dense ceramics and formed with a sealed space therein, a metal bulk material 4 installed in the space 7, and a terminal electrically connected to the material 4. The material 6 is made of the solid connector of the dense ceramics.</p>
申请公布号 JPH0982786(A) 申请公布日期 1997.03.28
申请号 JP19950263673 申请日期 1995.09.19
申请人 NGK INSULATORS LTD 发明人 NOBORI KAZUHIRO;KOBAYASHI HIROMICHI
分类号 H05B3/14;C04B37/00;H01L21/302;H01L21/3065;H01L21/324;H01L21/68;H01L21/683;H05B3/20;(IPC1-7):H01L21/68;H01L21/306 主分类号 H05B3/14
代理机构 代理人
主权项
地址