发明名称 |
SEMICONDUCTOR PROCESSING APPARATUS AND MANUFACTURE THEREOF |
摘要 |
<p>PROBLEM TO BE SOLVED: To make it possible to prevent the decrease of the connecting strength of a ceramic base material by preventing the rise of the resistance value or disconnection of a wire of a resistance heater even when a ceramic heater is repeatedly used at a high temperature in a semiconductor manufacturing apparatus. SOLUTION: The semiconductor treating apparatus comprises a base material 6 made of dense ceramics and formed with a sealed space therein, a metal bulk material 4 installed in the space 7, and a terminal electrically connected to the material 4. The material 6 is made of the solid connector of the dense ceramics.</p> |
申请公布号 |
JPH0982786(A) |
申请公布日期 |
1997.03.28 |
申请号 |
JP19950263673 |
申请日期 |
1995.09.19 |
申请人 |
NGK INSULATORS LTD |
发明人 |
NOBORI KAZUHIRO;KOBAYASHI HIROMICHI |
分类号 |
H05B3/14;C04B37/00;H01L21/302;H01L21/3065;H01L21/324;H01L21/68;H01L21/683;H05B3/20;(IPC1-7):H01L21/68;H01L21/306 |
主分类号 |
H05B3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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