| 摘要 |
PROBLEM TO BE SOLVED: To improve the accuracy of the alignment of a mask and a substrate and the accuracy of the superposition of a mask pattern image and shot regions on the substrate, by measuring the positions on the substrate of the images of a plurality of marks for positional detection on the mask, and subjecting the result of the measurement to statistical operation to obtain the offset value of the mask pattern. SOLUTION: The position of each of at least three marks for positional detection formed on a mask 2, is measured on the substrate 8 side after they are passed through a projection optical system PL. Based on the result of the measurement, data on offset to the position of the mask 2 is subjected to statistical operation. Based on the offset data, the state of the image formation in the projection optical system PL is adjusted and the mask 2 is aligned with the substrate 8. Thereafter, the substrate 8 is exposed to the pattern of the mask 2, and then the offset data is stored. Subsequently, the state of the image formation in the projection optical system PL is adjusted and the alignment of the mask 2 and the substrate 8 is performed based on the stored offset data when the position of the mask 2 and the base line are measured afresh. |
