发明名称 SILVER HALIDE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To minimize the flaking of a mat agent by a severe friction in quick processing or the like by specifying the average of the total thickness of hydrophilic colloid layers, and containing a specified polymer grain in the outermost layer, etc., on a base. SOLUTION: In a silver halide photosensitive material having at least one photosensitive silver halide emulsion layer on a base, the average of the total thickness of hydrophilic colloid layers present on the base is 0.5μm or more and 6μm or less, and a polymer grain with an average grain size of 0.2μm or more and 10μm or less which has at least one of a functional group reacted with an inductive hardener to generate a covalent bond or a functional group reacted with gelatin to generate a covalent bond is contained in the outermost layer or an adjacent layer thereto on the base. The average grain size of the polymer grain is the average of diameter when the volume of the polymer grain is substituted by a sphere of the same volume. The total thickness means the sum of all layers present on one side of the base, for example, surface protecting layer, adjacent layers and emulsion layers.
申请公布号 JPH0980682(A) 申请公布日期 1997.03.28
申请号 JP19950261030 申请日期 1995.09.14
申请人 FUJI PHOTO FILM CO LTD 发明人 OYAMADA TAKAYOSHI
分类号 G21K4/00;G03C1/00;G03C1/035;G03C1/09;G03C1/46;G03C1/76;G03C1/95;G03C5/17;(IPC1-7):G03C1/76 主分类号 G21K4/00
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