| 摘要 |
<p>PROBLEM TO BE SOLVED: To correct the nonuniformity of the illuminance within an exposure surface by placing a photosensitive plate capable of forming a light shieldable layer on a transparent substrate near an exposure mask and placing a correction mask at the position where the photosensitive plate of the exposure device is exposed. SOLUTION: The correction mask 9 having light shieldable layers of the continuous gradations having the large extent of shielding light in the parts where the illuminance of the incident light on the exposure mask 6 surface is high and the small extent of shielding the light in the parts where the illuminance is low, formed on the transparent substrate, is placed on the position just before the incident light arriving from a light source 1 arrives at the exposure mask 6. As a result of it, the incident light passing the correction mask 9 is made into the uniform light corrected of the illuminance and the incident light on the exposure mask 6 has also the illuminance uniform over the entire surface of the mask. Therefore, the illuminance of the exposing light passing the exposure mask 6 becomes uniform without the uniformity by the sections. The exposing light arrives as the light of the uniform illuminance at a plate 8 to be worked. Such correction mask 9 is obtd. by exposure and development using the photosensitive plate 10.</p> |
