发明名称 FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM
摘要 A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin, a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.
申请公布号 WO9711100(A1) 申请公布日期 1997.03.27
申请号 WO1996US14946 申请日期 1996.09.18
申请人 HOECHST CELANESE CORPORATION 发明人 RAHMAN, M., DALIL;AUBIN, DANIEL, P.;KHANNA, DINESH, N.;DIXIT, SUNIT, S.
分类号 G03F7/004;C08G8/00;C08G8/08;C08L61/06;G03F7/023;(IPC1-7):C08G8/08;G03F7/032 主分类号 G03F7/004
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