发明名称 |
FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM |
摘要 |
A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin, a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.
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申请公布号 |
WO9711100(A1) |
申请公布日期 |
1997.03.27 |
申请号 |
WO1996US14946 |
申请日期 |
1996.09.18 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
RAHMAN, M., DALIL;AUBIN, DANIEL, P.;KHANNA, DINESH, N.;DIXIT, SUNIT, S. |
分类号 |
G03F7/004;C08G8/00;C08G8/08;C08L61/06;G03F7/023;(IPC1-7):C08G8/08;G03F7/032 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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