Thin film liquid crystal display of an active type

摘要

The display has a silicon oxide base film formed on a glass substrate 101. The substrate is then covered by an amorphous silicon film to form an active layer 102 and is then crystallised using laser light. A silicon oxide film is 100 overlaid as a gate isolation film. A wiring layer in sections is formed to create gate electrodes 106,107,108 in aluminium foil and these are then processed with resistive masking 103,104, 105 to form the required structure.