发明名称 FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM
摘要 <p>A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin, a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.</p>
申请公布号 WO1997011100(A1) 申请公布日期 1997.03.27
申请号 US1996014946 申请日期 1996.09.18
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