A METHOD FOR MANUFACTURING PHASE REVERSAL MASK

摘要

A phase inverting mask and a manufacturing process thereof capable of preventing a sensitive film pattern from being formed thinly by a light which has transmitted through a shield film pattern are disclosed. In the mask, a first shield film pattern(23) is formed on an area which is not exposed to a light on a transparent substrate and has some optical transmissivity. A phase inverting film pattern(25) is formed on first shield film pattern(23) and has the same pattern as the first shield film pattern(23). A second shield film pattern(24) is formed on all areas of phase inverting film pattern(25) except an edge of phase inverting film pattern(25) so that second shield film pattern(24) has an optical transmissivity of zero at the area which is not exposed to a light.