发明名称 Verfahren zum Ausbilden eines Kurzschlusses zwischen der Emitterzone und der benachbarten Zone entgegengesetzten Leitungstyps eines steuerbaren Siliziumgleichrichterelementes
摘要 975,990. Semi-conductor devices. ASSOCIATED ELECTRICAL INDUSTRIES Ltd. July 29, 1963 [Aug. 15, 1962], No. 31324/62. Heading H1K. A short-circuit between the emitter region 4 of a silicon controlled-rectifier element 1 and the adjacent region of opposite conductivity type is formed by depositing gold in finelydivided form (preferably by evaporation) on to a surface of the element 1 in vacuo to form a layer 8 in contact with both the regions after the element 1 has been heated to a temperature at which the gold forms a eutectic with the silicon, and then cooling the element sufficiently quickly for the gold to solidify before impurity activating material present in the emitter region 4 enters into the gold.
申请公布号 DE1235434(B) 申请公布日期 1967.03.02
申请号 DE1963A043820 申请日期 1963.08.14
申请人 ASSOCIATED ELECTRICAL INDUSTRIES LIMITED 发明人 SADLER ALBERT JOHN
分类号 H01L23/482;H01L29/00 主分类号 H01L23/482
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