Electron beam lithography apparatus for LSI, VLSI and ELSI circuit manufacture

摘要

The apparatus includes several field emission electron sources, each containing needle-shaped cathodes, and the electron gun generates an electron beam of shaped cross-section secured by a perforated shadow mask. A projection lens focusses the images of a perforation of the shadow mask onto a material to be structured. Between the electron gun and the projection lens is located a condenser lens assisting to focus the images of the electron emission regions at the front focal point of the projection lens. An electron beam deflector determines a position, at which the images of the perforation are focussed on the materials.