发明名称 Semiconductor device having crystalline thin film transistors
摘要 A semiconductor device has a first thin film transistor and a second thin film transistor formed on a substrate. Both of the first and second thin film transistor have a crystallized channel region. One of the first and second thin film transistor is doped with a catalyst metal at a sufficient concentration for promoting the crystallization of the channel region which the other of the first and second thin film transistors is not doped with the catalyst metal.
申请公布号 US5614733(A) 申请公布日期 1997.03.25
申请号 US19940354502 申请日期 1994.12.12
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., INC. 发明人 ZHANG, HONGYONG;TAKAYAMA, TORU;TAKEMURA, YASUHIKO
分类号 G02F1/1362;H01L21/20;H01L21/77;H01L21/84;(IPC1-7):H01L29/76;H01L31/036;H01L31/112 主分类号 G02F1/1362
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