发明名称 |
Semiconductor device having crystalline thin film transistors |
摘要 |
A semiconductor device has a first thin film transistor and a second thin film transistor formed on a substrate. Both of the first and second thin film transistor have a crystallized channel region. One of the first and second thin film transistor is doped with a catalyst metal at a sufficient concentration for promoting the crystallization of the channel region which the other of the first and second thin film transistors is not doped with the catalyst metal.
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申请公布号 |
US5614733(A) |
申请公布日期 |
1997.03.25 |
申请号 |
US19940354502 |
申请日期 |
1994.12.12 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., INC. |
发明人 |
ZHANG, HONGYONG;TAKAYAMA, TORU;TAKEMURA, YASUHIKO |
分类号 |
G02F1/1362;H01L21/20;H01L21/77;H01L21/84;(IPC1-7):H01L29/76;H01L31/036;H01L31/112 |
主分类号 |
G02F1/1362 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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