发明名称 |
Photolithographically patterned spring contact |
摘要 |
A photolithographically patterned spring contact is formed on a substrate and electrically connects contact pads on two devices. The spring contact also compensates for thermal and mechanical variations and other environmental factors. An inherent stress gradient in the spring contact causes a free portion of the spring contact to bend up and away from the substrate. An anchor portion remains fixed to the substrate and is electrically connected to a first contact pad on the substrate. The spring contact is made of an elastic material and the free portion compliantly contacts a second contact pad, thereby electrically interconnecting the two contact pads.
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申请公布号 |
US5613861(A) |
申请公布日期 |
1997.03.25 |
申请号 |
US19950478578 |
申请日期 |
1995.06.07 |
申请人 |
XEROX CORPORATION |
发明人 |
SMITH, DONALD L.;ALIMONDA, ANDREW S. |
分类号 |
G01R1/067;G01R1/073;H01L21/48;H01L21/60;H01L21/66;H01L23/48;H01L23/485;H01R12/04;H01R13/24;H05K3/32;H05K3/40;(IPC1-7):H01R9/03;H05K1/14 |
主分类号 |
G01R1/067 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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