发明名称 |
Using a Lewis base to control molecular weight of novolak resins |
摘要 |
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
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申请公布号 |
US5614349(A) |
申请公布日期 |
1997.03.25 |
申请号 |
US19920997942 |
申请日期 |
1992.12.29 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
RAHMAN, M. DALIL;AUBIN, DANIEL P.;DURHAM, DANA L.;DAMMEL, RALPH R. |
分类号 |
C08G8/00;C08G8/08;C08G8/10;G03F7/023;(IPC1-7):G03F7/023;C08G8/04 |
主分类号 |
C08G8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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