Fluoroalkyltrisulfonylmethanes

摘要

The invention comprises compounds of the formula [RSO2]3CH, where each R is alkyl, tolyl, cyclohexyl or C2- 21 alkoxyalkyl or C8- 29 alkylphenylalkyl, and at least one R being or containing a fluoroalkyl group; and amine and ammonium salts thereof, and salts with metals of valency 1-4. The compounds above may be prepared (1) by reacting RSH with HCOOH or a C1- 6 alkyl formate in the presence of HCl to produce (RS)3CH, and oxidizing with a 100% excess of peracetic acid at - 20 DEG to - 30 DEG C. to give (RSO2)3CH (all R's the same); (2) by electrochemical fluorination of a trisulphonyl-methane using HF, followed by hydrolysis; or (3) by processes as used in examples for compounds in which the R's are different (see below). Metals specified for salt formation (by reaction with the base, e.g. NaOH, KOH, Ca(OH)2, or oxide, e.g. ZnO, or by double decomposition) are Li, Na, K, Mg, Ca, Ba, Fe, Co, Ni, Ru, Rh, Pd, Os, Ir, Pt, Cu, Ag, Au, Zn, Cd, Hg, Sn, Pb, Sb, Bi and Al. Examples prepare (1) [CF3(CF2)5CH2SO2]3CH, via [CF3(CF2)5CH2S]3CH (from the mercaptan and ethyl formate; (2) [CHF2(CF2)3CH2SO2]3CH; (3) by reacting formalin and CH3SH to give (CH3S)2CH2, oxidizing to (CH3SO2)2CH2, reacting with CH3SO2.SCH2(CF2)16CF3 to give , which is then oxidized; (4) as in Example 3, via corresponding intermediates; (5) via the trisulphide; (6) via (tolylSO2)2CH2; (8) and (9) [CF3(CF2)6SO2]3CH and its Na salt. The compounds of the invention are surfactants.