发明名称 |
Method for preparing high resolution polyimide images using non-photosensitive layers of poly(amic acid) or salts thereof |
摘要 |
A method for preparing high resolution wash-off polyimide images is described having the sequential steps of (a) providing a non-photosensitive layer containing a substantially non-crystalline poly(amic acid) polymer or salt thereof on a substrate; (b) applying an aqueous ink imagewise to the non-photosensitive layer to change the solubility in the ink-applied areas, the aqueous ink containing a solubility altering agent; (c) washing the non-photosensitive layer with an aqueous solution to remove the soluble areas; and (d) converting the poly(amic acid) polymer to a polyimide.
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申请公布号 |
US5609914(A) |
申请公布日期 |
1997.03.11 |
申请号 |
US19950433275 |
申请日期 |
1995.05.02 |
申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
MA, SHEAU-HWA;HERTLER, WALTER R.;SIMMONS, III, HOWARD E. |
分类号 |
B41J2/01;B41M3/00;B41M5/00;B41M5/50;B41M5/52;G03F7/00;H05K1/03;H05K3/06;(IPC1-7):B05D5/06 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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