| 摘要 |
PROBLEM TO BE SOLVED: To enable an exposure system to start carrying out an exposure process just after a light emission start where a light pattern of spike is outputted so as to be improved in throughput and to elongate expendables in service life by a method wherein the characteristic of a light source is measured, the target value of exposure is adequately set up, and a discharge voltage applied onto an excimer laser is adequately controlled at light pulse emission. SOLUTION: A light exposure calculator 102 converts electrical signals photoelectrically converted by a light exposure detector A12 or a light exposure detector B15 into logical values, and the logical values are inputted into a main control system 104. The main control system 104 is possessed of a memory means which stores a required light exposure given through an input device 105, the intrinsic parameters of an exposure system, and light exposure data and the like measured by a light exposure detecting means, and parameters necessary for exposure are calculated basing on the data stored in the memory means provided to the main control system 104 and transmitted to a laser control system 103 and a stage control system 101. The laser control system 103 outputs a trigger signal 16 and a charge voltage signal 17 using the parameters and corresponding to a required light exposure, whereby the application of a discharge voltage to a light source 1 and the light emission timing of the light source 1 are controlled. |
