| 摘要 |
PROBLEM TO BE SOLVED: To obtain a work waiting machine for preventing a waiting work from being dried before being cleaned at a cleaning section. SOLUTION: The unit for waiting a semiconductor wafer U before being fed to a cleaning section and cleaned comprises a container 21, a block 23 for supporting the work disposed in the container 21, and a passage 25 made in the supporting block 23 and feeding a fluid for preventing the surface of semiconductor wafer to be cleaned from being dried. |
