| 摘要 |
A method for selectively altering the refractive index of selected portions of a polyimide material can be used to form a variety of optical components, such as waveguides that can be used as optical interconnections between elements in electronic or microelectronic circuits. The method includes the steps of introducing a dopant which is capable of altering the index of refraction of the film and which will be photoattached to the polyimide material after exposure to radiation, exposing selected portions of the material to radiation, removing at least some of the dopant from the non-irradiated portions of the material, and then exposing the non-irradiated portions of the material to radiation of a type and quantity sufficient to alter the index of refraction of the material.
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