发明名称 Method of making a FET having a recessed gate structure
摘要 A Field Effect Transistor having a recessed gate comprises a substrate, a source electrode and a drain electrode, a recessed channel region formed over an area of the semiconductor substrate between the source electrode and the drain electrode, and a gate electrode inclined toward the source electrode and formed over the recessed channel portion.
申请公布号 US5610090(A) 申请公布日期 1997.03.11
申请号 US19960589569 申请日期 1996.01.22
申请人 GOLDSTAR CO., LTD. 发明人 JO, JUN W.
分类号 H01L21/285;H01L21/308;H01L21/338;H01L29/812;(IPC1-7):H01L21/265;H01L21/20;H01L21/44;H01L21/48 主分类号 H01L21/285
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