发明名称 FORMATION OF EXPOSURE PATTERN AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To make it possible to switch plural kinds of exposure patterns with one device by switching the coating conditions and/or exposure conditions of a photoresist according to desired exposure patterns. SOLUTION: A conducting film layer 11 is formed on the resist 10B remaining on one surface A of a glass substrate 1 and the one surface A of the glass substrate 1 exposed via this remaining resist 10B. An electroforming layer 12 of a prescribed thickness is formed by electroforming, etc., on this conducting film layer 11. In succession, the conducting film layer 11 and the electroforming layer 12 are integrally peeled from the glass substrate 1 and thereafter, its surface is washed. As a result, a stamper 13 dealing with a high density is formed. In such a case, the production by easily switching the stamper 23 corresponding to the optical disk of the conventional type and the stamper 13 dealing with the optical disk of the high-density type is made possible by switching the prebaking temp. and time of the resist layers 10, 20 and the cutting output of a laser hνfor exposure.
申请公布号 JPH0963129(A) 申请公布日期 1997.03.07
申请号 JP19950240605 申请日期 1995.08.25
申请人 SONY DISC TECHNOL:KK 发明人 MINEGISHI SHINJI;HAN NII;SHIRASAGI TOSHIHIKO
分类号 G11B7/26;(IPC1-7):G11B7/26 主分类号 G11B7/26
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