发明名称 |
Transfer of topological images in prodn. of masks |
摘要 |
The transfer of topological images comprises: (i) covering a layer of chromium oxide on the surface of a substrate with a layer of a sensitive polybutene sulphone (PBS) resin; (ii) sensitising the resin layer by an appropriate form of radiation in an area corresp. to the outline of the image to be transferred; (iii) elimination of the sensitised resin in this zone using a developing soln. consisting principally of two prods., one of which is isoamyl acetate; (iv) rinsing with a rinsing soln. consisting of the same two prods. mixed in different proportions; (v) removing by engraving the chromium oxide revealed by this process; (vi) elimination of the remaining non-sensitised resin; and (vii) use as the second prod. in the developing and rinsing solns. of monoethylic ether of diethylene glycol.
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申请公布号 |
FR2738361(A1) |
申请公布日期 |
1997.03.07 |
申请号 |
FR19950010207 |
申请日期 |
1995.08.30 |
申请人 |
SOCIETE NOUVELLE DES ETABLISSEMENTS JULES VERGER ET DELPORTE |
发明人 |
ESTIER ERIC |
分类号 |
G03F7/32;(IPC1-7):G03F1/08 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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