发明名称 Transfer of topological images in prodn. of masks
摘要 The transfer of topological images comprises: (i) covering a layer of chromium oxide on the surface of a substrate with a layer of a sensitive polybutene sulphone (PBS) resin; (ii) sensitising the resin layer by an appropriate form of radiation in an area corresp. to the outline of the image to be transferred; (iii) elimination of the sensitised resin in this zone using a developing soln. consisting principally of two prods., one of which is isoamyl acetate; (iv) rinsing with a rinsing soln. consisting of the same two prods. mixed in different proportions; (v) removing by engraving the chromium oxide revealed by this process; (vi) elimination of the remaining non-sensitised resin; and (vii) use as the second prod. in the developing and rinsing solns. of monoethylic ether of diethylene glycol.
申请公布号 FR2738361(A1) 申请公布日期 1997.03.07
申请号 FR19950010207 申请日期 1995.08.30
申请人 SOCIETE NOUVELLE DES ETABLISSEMENTS JULES VERGER ET DELPORTE 发明人 ESTIER ERIC
分类号 G03F7/32;(IPC1-7):G03F1/08 主分类号 G03F7/32
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