| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a color filter excellent in coatability, developability and pattern reproducibility and also to provide a compsn. excellent in dispersion stability of a pigment as a pigment dispersed radiation sensitive compsn. for producing a color filter by photolithography. SOLUTION: This radiation sensitive compsn. contains a graft copolymer having a wt. average mol.wt. of 3×10<-4> -1×10<6> and contg. a monofunctional macromonomer having a wt. average mol.wt. of 1×10<3> -2×10<4> as a copolymerizable component, a radiation sensitive compd. and a pigment. The macromonomer is obtd. by bonding polymerizable double bonds to the terminals of the blocks (B) of an A-B block copolymer consisting of blocks (A) each having an acidic group and the blocks (B) having no acidic group.</p> |
