| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive photoresist compsn. having high resolution, high sensitivity and excellent heat resistance by incorporating an alkali-soluble resin, a naphthoquinone diazide compd. and a cyclic terpene polyhydric phenol compd. SOLUTION: This resin contains an alkali-soluble resin (A), a naphthoquinone diazide compd. (B) and a cyclic terpene polyvalent phenol compd. (C). As for the alkali-soluble resin (A), a novolac resin is preferable. As for the naphthoquinone diazide compd., a naphthoquinone diazide sulfonate of a polyhydroxy compd. can be used. As for the cyclic terpene polyvalent phenol compd., for example, a compd. expressed by the structural formula can be used. In formula, R1-R4 are hydrogen atoms or methyl groups. The compounding ratio of A, B, C is selected from the following range. To 100 pts.wt. of (A), 5-100 pts.wt. of (B), preferably 10-50 pts.wt., and 0.5-100 pts.wt. of (C), preferably 1-50 pts.wt. are compounded. The obtd. compsn. is excellent in resolution, etc., and is suitable for the production of a highly integrated circuit. |
