发明名称 Verfahren zur Herstellung einer Halbleiteranordnung mit einem Kondensator mit einem ferroelektrischen Dieletrikum und Halbleiteranordnung mit einem derartigen Kondensator
摘要 A method of manufacturing a semiconductor device whereby a capacitor (2) is provided on a surface (10) of a semiconductor body (3) with a semiconductor element (1) in that a lower electrode (11), an oxidic ferroelectric dielectric (12) and an upper electrode (13) are provided in that order, the upper electrode not covering an edge of the dielectric, after which an insulating layer (14) with superimposed metal conductor tracks is provided. According to the invention, the edge of the dielectric (12) not covered by the upper electrode (13) is coated with a coating layer (14, 20, or 30) practically imperviable to hydrogen, after which the device is heated in a hydrogen-containing atmosphere. Heating in a hydrogen atmosphere neutralizes dangling bonds which arise during deposition of the conductor tracks on the insulating layer, while the coating layer protects the dielectric from attacks by hydrogen. The semiconductor device then has a shorter access time. <IMAGE>
申请公布号 DE69213094(T2) 申请公布日期 1997.03.06
申请号 DE1992613094T 申请日期 1992.05.04
申请人 PHILIPS ELECTRONICS N.V., EINDHOVEN, NL 发明人 WOLTERS, ROBERTUS ADRIANUS MARIA, NL-5656 AA EINDHOVEN, NL;LARSEN, POUL KJAERBY, NL-5656 AA EINDHOVEN, NL;ULENAERS, MATHIEU JOSEPH EMANUEL, NL-5656 AA EINDHOVEN, NL
分类号 H01G7/06;H01L21/02;H01L21/318;H01L21/822;H01L21/8246;H01L27/04;H01L27/105;H01L27/115;H01L29/49 主分类号 H01G7/06
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