| 摘要 |
Sulfonium salt compounds represented by general formula (I): wherein R1 and R2 represent each alkyl, hydroxy, alkoxy, alkylcarbonyl, aromatic carbonyl, aromatic thio or halogeno; R3 represents alkyl; R4 represents optionally substituted alkyl, alkenyl or cycloalkyl; m and n are each 0, 1, 2 or 3; and X represents a non-nucleophilic anionic residue; a cationic polymerization initiator containing the compound; and a curable composition which contains the compound and a cationically polymerizable compound optionally together with a sensitizer and is usable appropriately in coatings, adhesives, photoresists, etc. |
