发明名称 |
Verfahren zum Kompensieren des durch eine äußere Einflußgröße verursachten Fehlverhaltes von Meßeinrichtungen |
摘要 |
The invention relates to a process for compensating for the incorrect operation of measuring devices fitted with a programming section caused by external influences in which the measuring devices together with a sensor responding to the influence are fitted in a chamber exposed to said influencing factor. When the influencing factor changes, measurements from the measuring device and the sensor are detected by a data processing system which provides the programming section of the measuring devices with signals compensating for the incorrect operation caused by said influencing factor. In order to be able to perform such a process rapidly and thus economically, the influencing factor is continuously changed and the current output value of the sensor (6) and the current measurement provided by the measuring device (3) are detected with a timing predetermined by the data processing system. |
申请公布号 |
DE19533505(A1) |
申请公布日期 |
1997.03.06 |
申请号 |
DE1995133505 |
申请日期 |
1995.09.04 |
申请人 |
SIEMENS AG, 80333 MUENCHEN, DE |
发明人 |
KRISCH, BURKHARD, DIPL.-PHYS., 12307 BERLIN, DE |
分类号 |
G01D3/028;G01D3/036;G01L19/04;(IPC1-7):G01D3/028;G01D1/16 |
主分类号 |
G01D3/028 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|