Unit generating plasma for surface treatment of substrates by e.g. plasma polymerisation or hard facing

摘要

This unit generates a plasma treating substrates (1) in a vacuum chamber (5). High frequency electromagnetic waves, e.g. microwaves are used, esp. for the plasma polymerisation of monomers into substrate coatings. The RF from the source, e.g. a microwave generator (2) is coupled into a reaction space (8) where the plasma is excited in a plasma zone (10). The novel feature is separation of plasma zone and substrate. The coating zone (18) containing the substrate (1) is arranged in the vacuum chamber (5) in a direction transverse to that in which the RF is coupled in, and close to the plasma zone. Also claimed is a method of producing the plasma treating substrates as described, in which the substrate coating zone (18) lies outside the radiation and plasma zones