| 摘要 |
<p>A semiconductor processing station (10) which utilizes a processing head (20) and processing base (30) which are complementary to enclose a processing chamber (13). The processing head (20) shown has a rotor (140) with two portions (130, 150) both of which rotate. The rotor has axial movable portions which include a piece holder (130). The piece holder (130) supports a wafer (102) or other semiconductor piece being processed. The piece holder (130) can be axially extended and retracted relative to a thin membrane (121) which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.</p> |
