发明名称 Vessel of pyrolytic boron nitride
摘要 <p>Proposed is an improvement in a vessel, e.g., crucible, of pyrolytic boron nitride (PBN) used, for example, in the process of molecular beam epitaxy for melting silicon and the like at a high temperature. Different from conventional PBN crucibles used for such a process, in which contamination of high-purity silicon is unavoidable by the reaction of molten silicon with PBN or a thermal decomposition products of boron nitride, the inventive PBN vessel is provided on the surface with a protective coating layer of pyrolytic graphite or a refractory metal such as platinum so as not to cause troubles due to contamination of high-purity silicon melted therein with the crucible materials.</p>
申请公布号 EP0759416(A2) 申请公布日期 1997.02.26
申请号 EP19960401796 申请日期 1996.08.19
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KANO, SHOJI;NAKAJIMA, RYOJI;KAWADA, NOBUO;KUROSAWA, YUKIO
分类号 C04B41/87;C04B35/583;C04B41/50;C04B41/51;C04B41/85;C04B41/88;C30B15/10;C30B23/06;C30B35/00;H01L21/203;(IPC1-7):C04B41/87 主分类号 C04B41/87
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