| 摘要 |
PROBLEM TO BE SOLVED: To produce an electrode material composed of aluminum or the alloy thereof having a firm film free form the peeling of the film and the generation of particles even at a high temp. and in a plasma atmosphere of gaseous fluorine series in plasma CVD treatment and dry etching treatment and to provide a method for producing the same. SOLUTION: This electrode material is composed of aluminum or the alloy thereof having an anodically oxidized film provided with fine pores of >=1,500 pieces/μm<2> on the surface, and as for the method for producing the same, aluminum or the alloy thereof is anodically oxidized by a reversal current method while, in an aq. soln. of sulfuric acid, the current density is increased from 0.5 to 10A/dm<2> and the electrolytic voltage from 6-7 to 20-25V, respectively by stages and thereafter is immersed in an aq. soln. of nitric acid of pH 3 to 5.
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