发明名称 Facility for grinding silicon nitride ceramic workpiece
摘要 An industrially feasible method of grinding silicon nitride ceramics is disclosed and provides a sufficiently smooth surface. Namely, the surface has a maximum height-roughness Rmax of 0.1 microns or less and a ten-point mean roughness Rz of 0.05 micron. Further, with this method, surface damage can be repaired while grinding. The vertical cutting feed rate of a grinding wheel into a workpiece should be within the range of 0.005-0.1 micron for each rotation of the working surface of the wheel and change linearly or stepwise. The cutting speed of the grinding wheel in a horizontal (rotational) direction should be within the range of 25 to 75 m/sec. With this arrangement, the contact pressure and grinding heat that is generated between the workpiece and the hard abrasive grains during grinding are combined. In other words, mechanical and thermal actions are combined.
申请公布号 US5605494(A) 申请公布日期 1997.02.25
申请号 US19950423726 申请日期 1995.04.18
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NISHIOKA, TAKAO;MATSUNUMA, KENJI;YAMAKAWA, AKIRA
分类号 B24B1/00;B24B7/22;B24B19/22;B24D3/00;C04B35/584;(IPC1-7):B24B7/22 主分类号 B24B1/00
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