发明名称 EVALUATION METHOD OF DEFECT GENERATED ON SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a technique for evaluation of the defect distribution in a semiconductor, to provide a technique to presume the chemical state of defect, and to provide a method of evaluation of the number of defects. SOLUTION: The distribution of defects is recognized by measuring the distribution of hydrogen by allowing the defects in a semiconductor to adsorb hydrogen, the state of defects is found by analyzing the secondary ion mass of thermal desorbing atoms, the rate of peak strength of spectral is obtained and the number of defects is computed.
申请公布号 JPH0955415(A) 申请公布日期 1997.02.25
申请号 JP19950208581 申请日期 1995.08.16
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 YABUMOTO CHIKAKUNI;HONMA YOSHIKAZU;SATO YOSHIYUKI;SAITO KAZUYUKI
分类号 G01N23/225;H01L21/66 主分类号 G01N23/225
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