发明名称 |
Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers |
摘要 |
A method for forming lenslets which collect light and focuses it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate and forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer so that the mask pattern corresponds to lenslets to be formed, The method further includes anisotropically plasma etching the transparent lenslet-forming layer according to the thin etch-stop mask pattern, removing the thin etch-stop mask, and thermally reflowing the patterned transparent layer to form the transparent lenslets.
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申请公布号 |
US5605783(A) |
申请公布日期 |
1997.02.25 |
申请号 |
US19950369235 |
申请日期 |
1995.01.06 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
REVELLI, JOSEPH F.;HIRSH, JEFFREY I.;JECH, JOSEPH;ROBELLO, DOUGLAS R.;BARRY, STEPHEN P.;NUTT, ALAN C. G. |
分类号 |
G02B3/00;G02B6/12;G02B6/122;G02B6/124;G03F7/00;H01L27/146;(IPC1-7):G03F7/40 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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