| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist compsn. having high sensitivity in a deep UV region, less liable to a change in sensitivity and image quality even with time after exposure and generating no standing wave by incorporating a styrene copolymer represented by specified formulae, an addition product of a phenolic compd. represented by a specified formula and an optical acid generating agent. SOLUTION: This compsn. contains a copolymer (A) contg. constituent units represented by formulae I, II, an addition product (B) of a phenolic compd. represented by formula III to 2,3-dihydropyran and an optical acid generating agent. In the formula III, each of R<1> -R<4> is halogen, alkyl, alkoxy or aralkyl, each of (a) and (b) is a positive number of 0-4 and R<3> and R<4> may form a fluorene ring. The copolymer A contains 10-60mol% constituent units represented by the formula I, 40-90mol% constituent units represented by the formula II and <=30mol%, preferably <=20mol% other constituent units. Both of the copolymer A and the compd. B are low molecular dissolution inhibitors whose solubilities to an alkali developer are increased by an acid generated from the optical acid generating agent. |
