| 摘要 |
<p>A flexible, modular thin film deposition machine (10) comprises a number of batch process stations (12) which define a batch process path (16). At least one of the batch process stations (12) is a thin film deposition station (22, 36) including a serial deposition chamber (28, 38) and an inter-chamber disk transfer mechanism (30). The disks move in batches along the process path (16), being individually processed only at the deposition station (22, 36). Within the serial sputtering chambers (28, 38) of at least one deposition station (22, 36) there is at most partial environmental separation, whereas between different deposition stations (22, 36) the separation is made complete by utilization of valves (140, 141, 142, 143, 144, 145).</p> |
