发明名称 PROCEDIMENTO PER PRODURRE UN WAFER DI SEMICONDUTTORE E CORRISPONDENTE SISTEMA.
摘要 <p>An ingot is conveyed to a slicing machine by an ingot loader. Then, the ingot is cut into a wafer by the slicing machine. And, the cut wafer is conveyed to a peel-off portion and soaked in a warm water tank for a predetermined time so that the adhesive of the slice base can be heat softened, and then the slice base is hammered by a hammer rod so as to be peeled off from the wafer. Further, the wafer, from which the slice base has been peeled off, is conveyed to a wash-dry device, and washed and dried. The washed and dried wafer is conveyed to a surface inspecting device by a conveying device and judged a pass or fail to the wafer standard in the surface inspecting device. And, the passed wafer is conveyed to a chamfering device and the edge of the wafer is chamfered by the chamfering device. Then, the chamfered wafer is washed and dried by a wash-dry device, thereafter, conveyed to the storing part by the conveying device and stored.</p>
申请公布号 IT1267970(B1) 申请公布日期 1997.02.20
申请号 IT1994TO00006 申请日期 1994.01.10
申请人 TOKYO SEIMITSU CO., LTD. 发明人 NAGATSUKA SHINJI;KAGAMIDA TAKESHI
分类号 B28D5/00;H01L21/00;H01L21/677 主分类号 B28D5/00
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