发明名称 Passivierungsschichten zum Schutz funktionstragender Schichten von Bauelementen und Verfahren zu ihrer Herstellung
摘要 The invention relates to a passivation layer and a method for its production for protecting function-supporting layers of components, especially HTSL components, against contamination and/or chemical or physical alteration of these layers. The object of the invention, to specify a passivation layer of this kind which additionally makes possible the production of contact and/or conducting-track regions within itself, is achieved by a plasma-activated coating of the function-supporting layer(s) with a noble metal oxide or noble metal alloy oxide.
申请公布号 DE4307182(C2) 申请公布日期 1997.02.20
申请号 DE19934307182 申请日期 1993.03.08
申请人 INSTITUT FUER PHYSIKALISCHE HOCHTECHNOLOGIE E.V., 07743 JENA, DE 发明人 KOEHLER, THOMAS, 07747 JENA, DE;REDLICH, LUTZ, 07747 JENA, DE;STEENBECK, KLAUS, 07747 JENA, DE;STEINBEIS, ERWIN, 07743 JENA, DE
分类号 C23C14/08;H01L21/316;H01L23/29;H01L39/24;(IPC1-7):H01L23/28;C23C14/35;H01L21/60;H01L23/482;C04B35/50;H01L39/12 主分类号 C23C14/08
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