LCD active matrix substrate manufacturing method

摘要

In making an active matrix liquid crystal display a conductive layer is formed and etched to produce the source 7 and drain 8 regions of a thin film transistor. The source region includes a source pad 7A. A passivating layer 9 is then deposited and etched to form contact holes thereby exposing the source pad 7A the drain 8 and the gate pad. Indium tin oxide is then deposited and etched to form a pixel electrode 6. At the same time ITO pattern 6A is provided on source pad 7A which is part of the data line of the liquid crystal display.